Silicon and Silicon/Germanium Epitaxial Wafers
COMMERCE, DEPARTMENT OF
Who can apply
Total Small Business Set-Aside (FAR 19.5). SBA
About this opportunity
This solicitation is being amended again to answer public questions raised. The questions and the NIST response have been addressed as an updated attachment. No additonal changes have been made. This solicitation is being amended to answer public questions raised and to update a minimum specification. Question 1: For line items 1-7, could you please confirm the substrate diameter? Answer 1: The substrate diameter is 100 mm. Question 2: What is the preferred method of growth (1) CVD (Chemical Vapor Deposition) or (2) MBE (Molecular Beam Epitaxy). Answer 2: (B) The government is not specifying the production method and any production method that yields wafers meeting all specifications including thickness, composition, and coherency would be acceptable. Vendors may elect to use different gro...