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ClosedNo longer accepting applications

Dry etching of Combined Gallium Nitride Epitaxial Layer and Silicon Carbide Substrate

NATIONAL AERONAUTICS AND SPACE ADMINISTRATION

This opportunity closed July 10, 2026. 2 similar opportunities are open right now.

About this archived opportunity

See the attached SOW. All correspondence should reference ID# to ensure visibility. *PLEASE NOTE* THIS IS NOT A REQUEST FOR QUOTES. ANY PRICE OFFERS RECIEVED WILL NOT BE REVIEWED / ACCEPTED AT THIS TIME. A price quote alone generally does not provide sufficient information to evaluate a vendor's technical capability.

Historical details

Status
Closed
Deadline
July 10, 2026
First captured
July 7, 2026
Publisher reference
68ae1bb1385c408ea714a38ec1a30b49

Eligibility: No Set aside used. NONE

Free. One email, sent if this program reopens or a close match to it opens. We watch for 12 months, then stop. No list.

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